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Vacuum Plasma Spray Process
2024-05-17

Plasma Spray Process,is a relatively new technique,involves spraying semi-molten material onto a substrate surface to provide a functional coating.

 

Control of the chamber atmosphere during the process facilitates a reduction in the amount of impurities and contaminants, and results in higher-quality deposits. Because of the high energy density of the thermal plasma, materials with very high melting points, such as refractory metals and ceramics, can be deposited by this technique 。

By suitably manipulating the mandrel during the spray process, complex shapes can be built up. The molten particles hit the target surface and rapidly cool to form a stable structure. After the deposit solidifies, the mandrel can be removed and the process is complete (Fig. 2). VPSF is also capable of producing multi-layered, functionally graded structures and composite materials by spraying different materials with separate nozzles.

Lucky Precision Material Co., Ltd is a professional sputtering targets manufacturer, whose vacuum spraying target keeps leading in top standard with Soleras, with advanced vacuum plasma spraying process.

 

Advantages of vacuum spraying targets:

· High Purity

· High Density

· Low Oxygen

· Longer Service 

· Better Stability

· Competitive Price

Our targets including Si, SiAl, Ni, Cr, NiCr, Sn, In, InSn, ZnAl, Tiox, NbOx, ZrOx ect, widely used Low-E glass coating, optical coating, flexible electronics coating, photovoltaics coating.

 

If you have any interests, please reach me out at

grace-gu@nuoqitarget.com

 

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